Dutch equipment supplier SALD has announced delivery of a spatial atomic layer deposition system to an unnamed customer in the United States. The tool will be used in the pilot-scale production of ...

Next-generation Li-ion batteries must combine high energy density with long cycle life. Thin, conformal coatings on cathode and anode materials can enhance capacity retention and stability by acting ...

A Netherlands-based collaboration between Kalpana Systems, HyETSolar, and research laboratory TNO has been launched to advance the commercialisation of perovskite solar cells. The Perovision Project ...

Two Dutch manufacturers have teamed with TNO’s perovskite solar cell experts to integrate spatial atomic layer deposition equipment to produce ultra-thin, high-quality nickel-oxide hole transport ...

The NRC IRAP funding continues for three years and will assist Nfinite in deploying its pilot production plant in Waterloo, Ontario. This support will help the company finalize its first industrial ...

Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...

A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...

With its newly-developed “Spatial ALD” deposition system, Laser Zentrum Hannover can now also uniformly coat complex-shaped optics. The innovative system achieves higher deposition rates than ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...