A group of scientists from Hanyang University has published a report reviewing and discussing the outlook of atomic layer deposition (ALD) based oxide semiconductor thin film transistors (TFTs). The ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Adisyn has cleared its first real graphene technical hurdle with independently verified low-temperature deposition that ...

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...